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Electronic Devices Test 2

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Electronic Devices Test 2
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  • Question 1
    1 / -0

    Two GaAs wafers, one n-type and one p-type are uniformly doped such that ND (wafer 1) = NA (wafer 2) ≫ ni. Which wafer will exhibit the larger resistivity?

    Solution

    Concept:

    The resistivity of a doped semiconductor is calculated as:

    \(\rho = \frac{1}{{q\;\mu \;N}}\)

    Where,

    μ = mobility of the carrier

    N = number of concentration of carriers.

    For GaAs, the mobility of electrons is greater than the mobility of holes i.e.

    μn > μp

    Calculation:

    Given doping concentration of two wafers as:

    ND (wafer 1) = NA (wafer 2) ≫ ni

    The resistivity of the wafers will be:

    \({\rho _1} = \frac{1}{{q{\mu _n}{N_{D1}}}}\) for n type wafer 1

    \({\rho _2} = \frac{1}{{q{\mu _p}{N_{A2}}}}\) for p-type wafer – 2

    With ND1 = NA2, the resistivity of the wafer with less mobility of charge carriers will be more.

    Since for GaAs, μn > μp, we conclude that:

    ρ1 < ρ2

    ρ (wafer 1) < ρ (wafer 2)

  • Question 2
    1 / -0
    A DC voltage of 10 V is applied across on n-type silicon bar having a rectangular cross-section and length 1 cm. Electric field developed in length is given by \(E = \frac{V}{l}\), and mobility of electron is \(1000\frac{{c{m^2}}}{{V - sec}}\). If the time taken by the electron to move from 0 to 0.75 cm is t1 and time to move from 0.75 cm to 1.00 cm is t2 then \(\frac{{{t_1}}}{{{t_2}}}\) is
    Solution

    Concept:

    The electric field in a semiconductor for a given applied voltage V is given by:

    \(E = \frac{V}{l}\)

    l = length of the semiconductor

    Also, the drift velocity of electronics for a given applied field is calculated as:

    vd = μnE

    μn = Mobility of the electron

    Calculation:

    The electric filed developed in the semiconductor will be uniform with value:

    \(E = \frac{V}{l} = 10\;V/cm\)

    With μn = 1000 cm2/V-sec, the drift velocity will be:

    vd = μnE

    \(v_d= 1000\frac{{c{m^2}}}{{V- sec}} \times 10\frac{V}{{cm}}\)

    \(V_d= {10^4}\frac{{{\rm{cm}}}}{{{\rm{sec}}}}\)

    Time taken by the electron to move from 0 to 0.75 cm is t1, i.e.

    \(t_1 = \frac{{0.75}}{{{{10}^4}}} s\)

    Time taken by the electron to move from 0.75 to 1 cm is t2, i.e.

    \(t_2 = \frac{{0.25}}{{{{10}^4}}}s\)

    The ratio of t1 to t2 will therefore be:

    \(\frac{{{{\rm{t}}_1}}}{{{{\rm{t}}_2}}} = 3\)

    Note: Please note that we do not even require to evaluate the value of vd (Drift velocity), as it will get cancelled eventually.

  • Question 3
    1 / -0

    Hole mobility in Ge at room temperature is 1900 cm2/V-sec. The diffusion coefficient is ________cm2/sec.

    (Take kT/q = 25 mV)

    Solution

    Concept:

    According to Einstein's relation:

    \(\frac{D}{μ} = \frac{{kT}}{q}\)

    D = Diffusion coefficient of charge carrier

    μ = Mobility of the charge carrier

    \(\frac{kT}{q}=\) Thermal voltage

    Calculation:

    \(\frac{D}{1900} = 0.025\)

    D = 0.025 × 1900 cm2/sec

    D = 47.5 cm2/sec

  • Question 4
    1 / -0
    Consider a sample of silicon doped with 2 × 1016 cm-3 Boron atoms. Assume μn = 1300 cm2/Vsec, μp = 500 cm2/Vsec, ni = 1.5 × 1010 cm-3 and q = 1.6 × 10-19 C. The electric field required in the sample to induce a drift current density of J = 120 A/cm2 is:
    Solution

    Concept:

    The current density in a semiconductor for an applied electric field is given by:

    J = σ.E     …1)

    Where σ = conductivity of the semiconductor defined as:

    σ = qnμn + qpμp

    n = Electron concentration

    p = Holes concentration

    μn = Electron mobility

    μp = Hole mobility

    Calculation:

    Given, the semiconductor is doped with Boron (p-type impurity).

    So, Na = 2 × 1016 cm-3

    Since Na ≫ ni, the semiconductor will be dominated by Na only:

    So, σ = qnμn + qpμp ≈ qpμp = qNaμp

    Given, J = 120 A/cm2

    Using Equation 1),

    ⇒ 120 = (qNaμp).E

    \(E = \frac{{120}}{{q{N_a}{\mu _p}}} \)

    \(E= \frac{{120}}{{\left( {1.6 \times {{10}^{ - 19}}} \right)\left( {2 \times {{10}^{16}}} \right)\left( {500} \right)}}\)

    \(E = 75\;V/cm\)

  • Question 5
    1 / -0
    An n-types GaAs semiconductor is doped with Nd = 1016 cm-3 and Na = 0 at T = 300 K. The electron mobility is 8500 cm2/V-sec and hole mobility is 400 cm2/V-sec for GaAs. The minority carrier lifetime is τp0 = 2 × 10-7 sec. If a uniform generation rate g’ = 2 × 1021 cm-3 sec-1 is incident on the semiconductor, then the steady state increase in conductivity will be _______ (Ω – cm)-1
    Solution

    Concept:

    The conductivity for a semiconductor at thermal equilibrium in given as:

    σ = e(μn n + μp p)       ---(1)

    n = Concentration of electrons

    p= Concentration of holes

    The amount of exess carriers generated will increase the conductivity by increasing the number of charge carriers, i.e.

    Concentration of electron = n + δn

    Concentration of holes = p + δp

    The conductivity now will be:

    σnew = e(μn (n + δn) + μp (p + δp))      ---(2)

    The change (increase) in conductivity (Δσ) is calculated as:

    \({\rm{\Delta }}\sigma = e\left( {{\mu _n}\left( {n + δ n} \right) + {δ _p}\left( {p + δ p} \right)} \right) - e\;\left( {{\mu _n}n + {\mu _p}p} \right)\)

    Δσ = eμnδn + eμpδp

    Since the excess electron and holes are always generated in pairs, i.e. δp = δn, the conductivity can be written as:

    Δσ = e(μn + μp) δp 'or'

    Δσ = e(μn + μp) δn

    Calculation:

    The generation rate is the ratio of the excess carriers generated with the minority carrier lifetime, i.e.

    \(g' = \frac{{δ p}}{{{\tau _p}}}\)

    The excess hole concentration will be:    

    δp = g’ τp 

    \(δ p = 2 \times {10^{21}} \times 2 \times {10^{ - 7}}\)

    \(δ p = 4 \times {10^{14}}\;c{m^{ - 3}}\)

    The change in conductivity ‘or’ the conductivity is increased by:

    \(\therefore {\rm{\Delta }}\sigma = 1.6 \times {10^{ - 19}}\left( {8500 + 400} \right) \times 4 \times {10^{14}}\)

    = 0.57 (Ω cm)-1

  • Question 6
    1 / -0

    At T = 300 K, an n-type silicon sample contains a donor concentration Nd = 1016 cm-3 and intrinsic concentration ni = 1.5 × 1010 cm-3. The minority carrier hole lifetime is found to be τp0 = 20 μ sec.

    What will be the lifetime of the majority carrier electrons?

    Solution

    Concept:

    Mass-action law states that:

    \({n_0}{p_0} = n_i^2\)

    n0 = concentration electrons

    p0 = concentration of holes

    ni = Intrinsic carrier concentration

    Since the electrons and holes recombine in pairs, the minority carrier recombination rate will be equal to the majority carrier recombination rate, i.e.

    \(\frac{{{p_0}}}{{{\tau _{p0}}}} = \frac{{{n_0}}}{{{\tau _{n0}}}}\)

    τ = Recombination lifetime

    Calculation:

    Given, \({n_i} = 1.5 \times {10^{10}}\;c{m^{ - 3}}\)

    Nd = 1016 cm-3

    Nd ≫ ni

    The electron concentration is:

    n0 = Nd = 1016 cm-3

    Using mass-action law, the hole concentration (minority concentration) is obtained as:

    \({p_0} = \frac{{n_i^2}}{{{n_0}}}\)

    \({p_0} = \frac{{{{\left( {1.5 \times {{10}^{10}}} \right)}^2}}}{{{{\left( {10} \right)}^{16}}}}\)

    \({p_0} = 2.25 \times {10^4}\;c{m^{ - 3}}\)

    Now, the hole recombination rate in thermal equilibrium is:

    \({R_{p0}} = \frac{{{p_0}}}{{{\tau _{p0}}}}\)

    The recombination rate of majority carriers will be the same as that of minority carrier holes i.e.

    \(R_p'=R_n'\)

    \(\frac{{{p_0}}}{{{\tau _{p0}}}} = \frac{{{n_0}}}{{{\tau _{n0}}}}\)

    ∴ The lifetime of the majority carrier electron will be:

    \({\tau _{n0}} = \frac{{{n_0}}}{{{p_0}}}\;{\tau _{p0}}\)

    \({\tau _{n0}} = \frac{{{{10}^{16}}}}{{2.25 \times {{10}^4}}} \times 20 \times {10^{ - 6}}\)

    τn0 = 8.89 × 106 sec

  • Question 7
    1 / -0

    Consider a semiconductor in thermal equilibrium (no current). Assume that the donor concentration varies exponentially as Nd(x) = Nd0 exp (-αx) over the range 0 ≤ x ≤ 1/α ; where Nd0 is a constant.

    The electric field in the range 0 ≤ x ≤ 1/α will be:
    Solution

    Concept:

    The total current density in a semiconductor due to electrons is the sum of the diffusion current density (due to concentration gradient) and drift current density (due to electric field) i.e.

    \(J = e{\mu _n}nE + e\;{D_n}\frac{{dn}}{{dx}}\;\)       ---(1)

    n = Concentration of electron

    E = Electric field

    According to Einstein’s relation:

    \(\frac{{{D_n}}}{{{\mu _n}}} = \frac{{kT}}{q} = \frac{{kT}}{e}\)

    Calculation:

    Given that the donor concentration varies as:

    \({N_d}\left( x \right) = {N_{d0\;}}{e^{ - \alpha x}}\) for \(0 \le x \le \frac{1}{\alpha }\) 

    Given that the semiconductor is in thermal equilibrium (no current), i.e.

    J = 0

    Equation (1) can now be written as:

    \(e{\mu _n}E{N_{d0}}{e^{ - \alpha x}} + e\;{D_n}\;{N_{d0}}\left( { - \alpha } \right){e^{ - \alpha x}} = 0\)

    \(E = \frac{{{D_n}}}{{{\mu _n}}}\alpha \)       ---(2)

    Using Einstein’s relation, the above can be written as:

    \(E = \alpha \left( {\frac{{kT}}{e}} \right)\)

    ∴ The electric field in the given range \(0 \le x \le \;\frac{1}{\alpha }\) is independent of ‘x’.

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