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Electronic Devices Test 1

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Electronic Devices Test 1
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  • Question 1
    1 / -0

    Given the effective masses of holes and electrons in silicon respectively as:

    \(m_p^ \star = 0.56\;{m_0}\;and\;m_n^ \star = 1.08\;{m_0}\)

    What will be the position of the intrinsic Fermi energy level with respect to the center of the bandgap for the semiconductor at T = 300 K?

    (The Thermal voltage at 300 K is given as 26 mV)

    Solution

    Concept:

    For a given position of Fermi-level, the concentration of electrons and holes are given by:

    \({n_0} = {N_c}{e^{ - \frac{{\left( {{E_c} - {E_F}} \right)}}{{kT}}}}\)

    \({p_0} = {N_v}{e^{ - \frac{{\left( {{E_F} - {E_V}} \right)}}{{kT}}}}\)

    c and Nv are the effective density of states.

    We can now calculate the intrinsic Fermi level position.

    For the intrinsic semiconductor, the electron and hole concentrations are equal.

    ∴ We can write:

    \({N_c}\;{e^{ - \left( {\frac{{{E_c} - {E_{Fi}}}}{{kT}}} \right)}} = {N_v}\;{e^{ - \left( {\frac{{{E_{Fi}} - {E_v}}}{{kT}}} \right)}}\)

    Taking natural lag of both sides of the above equation, we get:

    \({E_{{F_i}}} = \frac{1}{2}\left( {{E_c} + {E_v}} \right) + \frac{1}{2}kT\;In\;\left( {\frac{{{N_v}}}{{{N_c}}}} \right)\)

    Since, \(\frac{1}{2}\left( {{E_c} + {E_v}} \right) = {E_{midgap}}\)

    \({E_{{F_i}}} = {E_{midgap}} + \frac{1}{2}kT\;In\left( {\frac{{{N_v}}}{{{N_c}}}} \right)\)

    \({E_{Fi}} - {E_{midgap}} = \frac{1}{2}kT\;In\;\left( {\frac{{{N_v}}}{{{N_c}}}} \right)\)    ---(1)

    Also, since \({N_c} \propto {\left( {m_n^*} \right)^{3/2}}\)

    And \({N_v} \propto {\left( {m_p^*} \right)^{3/2}}\)

    Equation (1) becomes:

    \({E_{{F_i}}} - {E_{mid}} = \frac{3}{4}\;ln\;\left( {\frac{{m_p^*}}{{m_n^*}}} \right)\)      ---(2)

    m*n = Effective mass of electron

    m*p = Effective mass of holes

    Calculation:

    Given, m*n = 1.08 m0

    m*p = 0.56 m0

    \({E_F} - {E_{mid}} = \frac{3}{4}kT\;In\left( {\frac{{0.56\;{m_0}}}{{1.08\;{m_0}}}} \right)\)

    \(= \frac{3}{4} \times 0.026 \times \left( { - 0.656} \right)\)

    =  -0.0128 eV

    The negative sign indicates that the Fermi level is 0.0128 below the centre of the bandgap.

  • Question 2
    1 / -0

    Assume Si with completely ionized dopants. If doping density, ND = 5.00 × 1016 cm3 , NA = 0 and T = 700 K, then the electron concentration in conduction Band (n) is __________ × 1016 cm-3

    (Assume ni (700 K) = 2.865 × 1016 cm-3)

    Solution

    Concept:

    For a compensated semiconductor with Donor concentration greater than the acceptor concentration, the majority carrier electron concentration is calculated as:

    \({n_0} = \frac{{{N_D} - {N_A}}}{2} + \sqrt {{{\left( {\frac{{{N_A} - {N_D}}}{2}} \right)}^2} + n_i^2} \)

    ni = Intrinsic concentration

    Note: If the donor concentration is very very greater than the intrinsic concentration, then we simply take the majority concentration as the donor concentration, i.e.

    For ND - NA >> ni

    n0 = ND - NA

    Calculation:

    Given: ND = 5.00 × 1016 cm, NA = 0 and ni = 2.865 × 1016 cm-3

    Since ND - NA is comparable to the the intrinsic concentration, we cannot take n0 = ND - NA.

    \({n_0} = \frac{{{N_D} - {N_A}}}{2} + \sqrt {{{\left( {\frac{{{N_A} - {N_D}}}{2}} \right)}^2} + n_i^2} \)

    \(\frac{{{N_D} - {N_A}}}{2} = \frac{{5 \times {{10}^{16}}}}{2} \)

    \(= 2.5 \times {10^{16}}\)

    \(n = \left( {2.5 \times {{10}^{16}}} \right) + \sqrt {{{\left( {2.5 \times {{10}^{16}}} \right)}^2} + {{\left( {2.865 \times {{10}^{16}}} \right)}^2}} \)

    \(n = 2.5 \times {10^{16}} + \sqrt {6.25 \times {{10}^{32}} + 8.21 \times {{10}^{32}}} \)

    n = (2.5 + 3.8) × 1016

    n = 6.3 × 1016 cm-3

  • Question 3
    1 / -0
    Consider Silicon at T = 300 K with doping concentrations of Nd = 1014 cm-3 and Na = 0. What will be the position of Fermi energy level with respect to the intrinsic Fermi level for the given doping concentrations?
    Solution

    Concept:

    The majority carrier electron concentration is given by:

    \({n_0} = {N_c}{e^{ - \frac{{\left( {{E_c} - {E_F}} \right)}}{{kT}}}}\)  ---(1)

    For an intrinsic semiconductor, the intrinsic carrier concentration will be:

    \({n_i} = {N_c}{e^{ - \frac{{\left( {{E_c} - {E_{{F_i}}}} \right)}}{{kT}}}}\)   ---(2)

    Equation (1) can be written as:

    \({n_0} = {N_c}{e^{ - \frac{{\left[ { - \left( {{E_c} - {E_{{F_i}}}} \right) + \left( {{E_F} - {E_F}} \right)} \right]}}{{kT}}}}\)

    \({n_0} = {N_c}{e^{ - \frac{{\left( {{E_c} - {E_{{F_i}}}} \right)}}{{kT}}}}{e^{\frac{{\left( {{E_F} - {E_{{F_i}}}} \right)}}{{kT}}}}\)

    Using Equation (2), the above equation can be written as:

    \({n_0} = {n_i}\;{e^{\frac{{\left( {{E_F} - {E_{{F_i}}}} \right)}}{{kT}}}}\)   ---(3)

    Application:

    With Nd – N­a ≫ ni, the majority carrier electron concentration will be:

    n0 = Nd - Na

    n0 = 1014 cm-3

    Taking natural l0g on both sides of the equation (3), we get:

    \(ln\left( {\frac{{{n_0}}}{{{n_i}}}} \right) = \frac{{{E_F} - {E_{{F_i}}}}}{{kT}}\)

    \({E_F} - {E_{{F_i}}} = kT\;ln\left( {\frac{{{n_0}}}{{{n_i}}}} \right)\)

    Putting on the respective values, we get:

    \({E_F} - {E_{{F_i}}} = 0.026\;ln\left( {\frac{{{{10}^{14}}}}{{{{10}^{10}}}}} \right)\)

    \({E_F} - {E_{{F_i}}} = 0.239\;eV\)

    ∴ The position of the Fermi level is 0.239 eV above the intrinsic Fermi level.
  • Question 4
    1 / -0

    Gallium arsenide at T = 300 K with an intrinsic concentration of 1.8 × 106 cm-3 contains acceptor impurity atoms at a density of 1015 cm-3. Additional impurity atoms are to be added so that the Fermi level is 0.45 eV below the intrinsic level. The concentration and the type of additional impurity atoms will be respectively:

    (The intrinsic carrier concentration ni = 1.8 × 106 cm-3 and kT = 26 mV)
    Solution

    Concept:

    The hole concentration for a p-type semiconductor is given by:

    \({p_0} = {n_i}{e^{\frac{{\left( {{E_{{Fi}}} - {E_F}} \right)}}{{kT}}}}\)

    EFi = Intrinsic Fermi Level

    ni = Intrinsic carrier concentration

    Application:

    Given doping concentration is:

    Na = 1016 cm-3

    Required Fermi level position is 0.45 eV below the intrinsic i.e.

    \({E_{{F_i}}} - {E_F} = 0.45\;eV\)

    So, we can calculate the required concentration of holes as:

    \({p_0} = {n_i}{e^{\frac{{\left( {{E_F}_i - {E_F}} \right)}}{{kT}}}}\)

    \({p_0} = \left( {1.8 \times {{10}^6}} \right){e^{\frac{{0.45}}{{0.026}}}}\)

    p0 = 6.32 × 1013 cm-3

    Since p0 (Required) < Na (Given)

    ∴ Donor atoms must be added to decrease this hole concentration to the required level.

    Since,

    p0 = Na - Nd

    With p0 = Required concentration

    Na = Already given concentration

    Nd = Na – p0

    Nd = 1015 – 6.32 × 1013

    ∴  9.368 × 1014 cm-3 additional donor impurity atoms must be added so that the Fermi level is 0.45 eV below the intrinsic level.

  • Question 5
    1 / -0
    A sample of silicon at T = 300 K is doped with boron at a concentration of 1.5 × 1015 cm-3 and with arsenic at a concentration of 8 × 1014 cm-3. The intrinsic carrier concentration of Si at T = 300 K is 1010 cm-3. The material is
    Solution

    Concept:

    For a compensated semiconductor with acceptor concentration greater than the donor concentration, the majority carrier hole concentration is calculated as:

    \({p_0} = \frac{{{N_a} - {N_d}}}{2} + \sqrt {{{\left( {\frac{{{N_a} - {N_d}}}{2}} \right)}^2} + n_i^2} \)

    With Na - Nd ≫ ni, the above equation becomes:

    p0 ≅ Na - Nd

    Also, the charge carriers at thermal equilibrium follow mass-action law, i.e.

    \({n_0}{p_0} = n_i^2\)

    Calculation:

    Boron is an acceptor atom (i.e a p-type impurity)

    Na = 1.5 × 1015 cm-3

    Arsenic is a donor atom (i.e. an n-type impurity)

    Nd = 8 × 1014 cm-3

    Since, Na > Nd, the given semiconductor is a p-type semiconductor.

    Also, since Na - Nd ≫ ni the majority carrier hole concentration will be:

    p0 = Na - Nd

    p0 = 1.5 × 1015 – 8 × 1014 cm-3

    p0 = (15 - 8) × 1014 cm-3

    p0 = 7 × 1014 cm-3

    Using mass action law

    \({n_0} = \frac{{n_i^2}}{{{p_0}}} = \frac{{{{10}^{20}}}}{{7 \times {{10}^{14}}}}\)

    n0 = 1.42 × 105 cm-3

  • Question 6
    1 / -0

    A semiconductor has a direct band gap of 2.5 eV. Of the incident light wavelengths given below, the one that cannot be absorbed is (Take h = 6.626 × 10-34, q = 1.6 × 10-19C)

    Solution

    When photon with energy less than 2.5 eV is incident on the semiconductor the recombination of hole electron doesn't take place, hence it cannot be detected 

    The wavelength corresponding to 2.5 eV band gap is

    \(\frac{{hc}}{\lambda } = 2.5 \times 1.6 \times {10^{ - 19}}\)

    \(\frac{{6.626 \times {{10}^{ - 34}} \times 3 \times {{10}^{ + 8}}}}{\lambda } = 2.5 \times 1.6 \times {10^{ - 19}}\)

    \(\lambda = 4.97 \times {10^{ - 7}}m\)

    ≃ 497 nm

    For λ > 497 nm

    \(E = \frac{{hc}}{\lambda } < 2.5\;eV\)

    Hence the photon cannot be absorbed by the semiconductor.

    ∴ Of the given wavelength 600 nm cannot be detected.
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